• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regions; Redistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer

Patent holdings for IPC class H01L 21/225

Total number of patents in this class: 1459

10-year publication summary

142
214
230
206
179
157
111
73
60
27
2015 2016 2017 2018 2019 2020 2021 2022 2023 2024

Principal owners for this class

Owner
All patents
This class
Taiwan Semiconductor Manufacturing Company, Ltd.
36809
150
International Business Machines Corporation
60644
129
Texas Instruments Incorporated
19376
56
Infineon Technologies AG
8189
51
Fuji Electric Co., Ltd.
4750
47
Semiconductor Manufacturing International (Shanghai) Corporation
1764
31
Hitachi Chemical Company, Ltd.
2455
30
Infineon Technologies Austria AG
1954
30
GLOBALFOUNDRIES U.S. Inc.
6459
28
Applied Materials, Inc.
16587
26
United Microelectronics Corp.
3921
26
Semiconductor Manufacturing International (Beijing) Corporation
1019
24
Tokyo Ohka Kogyo Co., Ltd.
1481
23
Samsung Electronics Co., Ltd.
131630
22
Intel Corporation
45621
21
Screen Holdings Co., Ltd.
2431
19
Toray Industries, Inc.
6652
18
Micron Technology, Inc.
24960
17
Commissariat à l'énergie atomique et aux energies alternatives
10525
16
Institute of Microelectronics, Chinese Academy of Sciences
1290
16
Other owners 679