- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regions; Redistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer
Patent holdings for IPC class H01L 21/225
Total number of patents in this class: 1459
10-year publication summary
142
|
214
|
230
|
206
|
179
|
157
|
111
|
73
|
60
|
27
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
150 |
International Business Machines Corporation | 60644 |
129 |
Texas Instruments Incorporated | 19376 |
56 |
Infineon Technologies AG | 8189 |
51 |
Fuji Electric Co., Ltd. | 4750 |
47 |
Semiconductor Manufacturing International (Shanghai) Corporation | 1764 |
31 |
Hitachi Chemical Company, Ltd. | 2455 |
30 |
Infineon Technologies Austria AG | 1954 |
30 |
GLOBALFOUNDRIES U.S. Inc. | 6459 |
28 |
Applied Materials, Inc. | 16587 |
26 |
United Microelectronics Corp. | 3921 |
26 |
Semiconductor Manufacturing International (Beijing) Corporation | 1019 |
24 |
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
23 |
Samsung Electronics Co., Ltd. | 131630 |
22 |
Intel Corporation | 45621 |
21 |
Screen Holdings Co., Ltd. | 2431 |
19 |
Toray Industries, Inc. | 6652 |
18 |
Micron Technology, Inc. | 24960 |
17 |
Commissariat à l'énergie atomique et aux energies alternatives | 10525 |
16 |
Institute of Microelectronics, Chinese Academy of Sciences | 1290 |
16 |
Other owners | 679 |